SEMICONDUCTOR MEMS CLEANING EQUIPMENT

ZEN

Single-Wafer Type Multiprocessor

A single type processor with a variety of chamber configurations to meet various process needs

ZEN Single-Wafer Type Multiprocessor Photo

This equipment supports a high concentration ozone and high temperature sulfuric acid allowing stable stripping of hardened resist.
This achieves processing to meet the applications by selecting from a wide variety of processing methods, including ultrasonic, two-fluid, and high-pressure JET. Available to meet the processing needs of various fields, such as MEMS, semiconductors, LEDs, and solar cells.

Features

Multi-Process Capable of recovering and reusing multiple chemicals
Module Configuration Capable of installing up to 8 chambers which are integrated with respective chamber modules
Significant Reduction in Running Costs Reduction of conventional resist stripping processing cost down to 1/16

Supported processes

Particle Removal / Resist Stripping / Lift-Off / Polymer Removal