SEMICONDUCTOR MEMS CLEANING EQUIPMENT

TH (Cassette)

TH (Cassette)

Batch-type equipment that can be optimally customized with our experiences and results in a wide range of fields

TH (Cassette) Photo

From manual to fully automatic, we can manufacture equipment to suit your applications. This supports a wide range of workpiece sizes with high quality and realizes a stable temperature control and highly accurate concentration control. This also supports a wide range of chemicals such as acids, alkalis, and organic solvents. This suits various drying methods such as spin drying, IPA vapor drying, and Marangoni drying.

Features

High Process Performance Simple processing structure and optimized circulation nozzles to ensure uniform circulation
High Throughput Available for a control system capable of controlling the conveyance between tanks to minimize the distance and the time
Improved Maintainability Parts laid out for easy maintenance
Equipment Design It can be designed for process optimization based on a wealth of experimental data
Extensive Results Available to offer the best equipment customized to meet your needs based on our results in a wide range of fields, including semiconductors and MEMS

Supported processes

RCA Cleaning / Nitride Film Removal / Oxide Film Removal / Polymer Removal / Resist Stripping / Silicon Etching / Sacrificial Layer Etching / Metal Etching / Developing