SEMICONDUCTOR MEMS CLEANING EQUIPMENT

SLO

Single Wafer Lift-Off Equipment

Single wafer lift-off equipment to perform wafer stripping treatment while dipping

SLO Photo

The combination of swelling and oscillation enhances the stripping power.
The down-flow system in the tank ensures to remove sludge and prevent retention in the tank to prevent reattachment. The highly efficient sludge collection system completely separates the chemicals in the circulation line from the sludge.

Features

Improvement in Yield Stabilizing the lift-off performance, ensured by the combination of vertical dipping and horizontal spin
High Throughput Achieved by optimizing the treatment tank layout and the conveyance mechanism
Improvement in Sludge Removal Performance Centrifugal separation sludge collection system is adopted
Precision Finish Cleaning Mechanism Compatible with three types of nozzle systems (two-fluid JET, megasonic, high pressure nozzles)
Supporting Thin Wafers Support mechanism Supporting thin wafers

Supported processes

Lift-Off / Resist Stripping / Polymer Removal