SEMICONDUCTOR MEMS CLEANING EQUIPMENT

BLO

Batch Type Lift-Off Equipment

The fastest and most versatile batch system in the history of the lift-off process

BLO Photo

Stable stripping performance is maintained by adopting a unique stripping system while increasing productivity by processing 25 wafers simultaneously. A wide variety of optional functions completely address all concerns such as residual peeling and reattachment of sludge.

Features

Lift-Off Stripping Power Rapid stripping achieved by use of powers by downflow in addition to swelling, oscillation and ultrasonic
Prevention of Reattachment Thorough removal of sludge and polymers with downflow and side jets
Ultrasonic Irradiation System Improvement in batch-to-batch ununiformity, by the multi-axis drivable ultrasonic system originally developed

Supported processes

Lift-Off / Resist Stripping / Polymer Removal